Kiyoshi Kageyama
at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Manufacturing, Time metrology, Software development, Photomasks, Optical proximity correction, Algorithm development, Process modeling

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Metrology, Cadmium, Data modeling, Calibration, Etching, Electrons, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Semiconductors, Scattering, Manufacturing, Inspection, Printing, Photomasks, Optical proximity correction, Neodymium, Carbon monoxide, Photomask technology

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Data modeling, Calibration, Databases, Etching, Glasses, Photomasks, Critical dimension metrology, Semiconducting wafers, Model-based design, Process modeling

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