Dr. Klaus-Dieter Roeth
Product Marketing Manager at KLA-Tencor MIE GmbH
SPIE Involvement:
Author
Publications (50)

PROCEEDINGS ARTICLE | June 12, 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Metrology, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Reticles, Metrology, Manufacturing, Image registration, Time metrology, Photomasks, Extreme ultraviolet, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Metrology, Optical lithography, Detection and tracking algorithms, Optical properties, Air contamination, Photomasks, Immersion lithography, High volume manufacturing

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Databases, Image processing, Control systems, Image registration, Photomasks, Neodymium, Overlay metrology

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Reticles, Metrology, Scanners, Error analysis, Ions, Manufacturing, Image registration, Photomasks, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Lithography, Reticles, Metrology, Calibration, Manufacturing, Image registration, Photomasks, Beam shaping, Nanofabrication, Model-based design

Showing 5 of 50 publications
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