Dr. Klaus-Peter Johnsen
at Physikalisch-Technische Bundesanstalt
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | April 3, 2010
Proc. SPIE. 7637, Alternative Lithographic Technologies II
KEYWORDS: Lithography, Electron beams, Teeth, Reflection, Sensors, Silicon, Monte Carlo methods, Objectives, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Edge detection, Detection and tracking algorithms, Image processing, Scanning electron microscopy, Printing, Monte Carlo methods, Image filtering, Photomasks, Algorithm development, 3D image processing

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Electron beams, Silica, Scattering, Sensors, Image acquisition, Chromium, 3D modeling, Scanning electron microscopy, Monte Carlo methods, Photomasks

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Electron beams, Metrology, Scattering, Sensors, 3D modeling, Scanning electron microscopy, Monte Carlo methods, Photomasks, Optical simulations, Semiconducting wafers

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Signal to noise ratio, Lithography, Electron beams, Scattering, Sensors, Etching, Monte Carlo methods, Signal detection, Vestigial sideband modulation, Direct write lithography

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