Dr. Klaus Edinger
Head Field of Business Repair at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Electron beams, Etching, Quartz, Particles, Molecules, Electrons, Ions, Chemistry, Photomasks, Extreme ultraviolet

Proceedings Article | 17 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Electron beams, Etching, Quartz, Molecules, Ions, Chemistry, Image resolution, Ion beams, Photomasks, Extreme ultraviolet

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Electron beams, Etching, Metals, Ultraviolet radiation, Silicon, Manufacturing, Scanning electron microscopy, Photomasks, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Electron beams, Magnesium, Cadmium, Optical properties, Opacity, Etching, Scanning electron microscopy, Bridges, Climatology, Yield improvement

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Electron beams, Opacity, Sensors, Etching, Quartz, Chemistry, Photomasks, Ion implantation, Resolution enhancement technologies

Showing 5 of 17 publications
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