Dr. Klaus Freischlad
Co-founder at InterOptics LLC
SPIE Involvement:
Conference Program Committee | Author
Publications (18)

PROCEEDINGS ARTICLE | September 13, 2012
Proc. SPIE. 8493, Interferometry XVI: Techniques and Analysis
KEYWORDS: Mirrors, Beam splitters, Metrology, Spatial frequencies, Interferometers, Cameras, Calibration, Interferometry, Linear filtering, Data acquisition

PROCEEDINGS ARTICLE | September 13, 2012
Proc. SPIE. 8494, Interferometry XVI: Applications
KEYWORDS: Monochromatic aberrations, Polishing, Metrology, Optical spheres, Visualization, Lenses, Interferometers, Inspection, Optical inspection, Surface finishing

PROCEEDINGS ARTICLE | November 21, 2007
Proc. SPIE. 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
KEYWORDS: Light sources, Phase shifting, Interferometers, Glasses, Reflectivity, Photomasks, Extreme ultraviolet lithography, Surface finishing, Phase shifts, Fizeau interferometers

PROCEEDINGS ARTICLE | September 14, 2007
Proc. SPIE. 6671, Optical Manufacturing and Testing VII
KEYWORDS: Refractive index, Light sources, Tunable lasers, Phase shifting, Reflection, Interferometers, Reflectivity, Surface finishing, Phase shifts, Fizeau interferometers

PROCEEDINGS ARTICLE | September 10, 2007
Proc. SPIE. 6672, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III
KEYWORDS: Wafer-level optics, Photovoltaics, Beam splitters, Metrology, Interferometers, Cameras, Interferometry, Dimensional metrology, Semiconducting wafers, Chemical mechanical planarization

PROCEEDINGS ARTICLE | September 10, 2007
Proc. SPIE. 6672, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III
KEYWORDS: Metrology, Reflection, Interferometers, Reflectivity, Interferometry, Wavefronts, Scanning probe microscopy, Semiconducting wafers, Phase shifts, Chemical mechanical planarization

Showing 5 of 18 publications
Conference Committee Involvement (2)
Advances in Metrology for X-Ray and EUV Optics II
30 August 2007 | San Diego, California, United States
Advances in Metrology for X-Ray and EUV Optics
2 August 2005 | San Diego, California, United States
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