Dr. Klaus Freischlad
Co-founder at InterOptics LLC
SPIE Involvement:
Conference Program Committee | Author
Publications (18)

PROCEEDINGS ARTICLE | September 13, 2012
Proc. SPIE. 8493, Interferometry XVI: Techniques and Analysis
KEYWORDS: Interferometers, Beam splitters, Calibration, Linear filtering, Cameras, Spatial frequencies, Interferometry, Mirrors, Data acquisition, Metrology

PROCEEDINGS ARTICLE | September 13, 2012
Proc. SPIE. 8494, Interferometry XVI: Applications
KEYWORDS: Inspection, Optical inspection, Surface finishing, Interferometers, Visualization, Lenses, Polishing, Metrology, Monochromatic aberrations, Optical spheres

PROCEEDINGS ARTICLE | November 21, 2007
Proc. SPIE. 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
KEYWORDS: Interferometers, Glasses, Extreme ultraviolet lithography, Phase shifts, Reflectivity, Fizeau interferometers, Photomasks, Surface finishing, Phase shifting, Light sources

PROCEEDINGS ARTICLE | September 14, 2007
Proc. SPIE. 6671, Optical Manufacturing and Testing VII
KEYWORDS: Phase shifts, Reflectivity, Fizeau interferometers, Surface finishing, Interferometers, Phase shifting, Tunable lasers, Reflection, Light sources, Refractive index

PROCEEDINGS ARTICLE | September 10, 2007
Proc. SPIE. 6672, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III
KEYWORDS: Semiconducting wafers, Interferometry, Interferometers, Photovoltaics, Dimensional metrology, Metrology, Wafer-level optics, Beam splitters, Cameras, Chemical mechanical planarization

PROCEEDINGS ARTICLE | September 10, 2007
Proc. SPIE. 6672, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III
KEYWORDS: Semiconducting wafers, Interferometry, Reflection, Metrology, Interferometers, Phase shifts, Reflectivity, Chemical mechanical planarization, Scanning probe microscopy, Wavefronts

Showing 5 of 18 publications
Conference Committee Involvement (2)
Advances in Metrology for X-Ray and EUV Optics II
30 August 2007 | San Diego, California, United States
Advances in Metrology for X-Ray and EUV Optics
2 August 2005 | San Diego, California, United States
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