Klaus Herold
at Infineon Technologies North America Corp
SPIE Involvement:
Publications (9)

Proceedings Article | 16 March 2009 Paper
D. Dunn, S. Mansfield, I. Stobert, C. Sarma, G. Lembach, J. Liu, K. Herold
Proceedings Volume 7274, 727412 (2009) https://doi.org/10.1117/12.814224
KEYWORDS: Optical proximity correction, Etching, Lithography, Semiconducting wafers, Process modeling, Photoresist processing, Reactive ion etching, Critical dimension metrology, Calibration, Photomasks

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72740Z (2009) https://doi.org/10.1117/12.813546
KEYWORDS: Semiconducting wafers, Etching, Data modeling, Optical proximity correction, Instrument modeling, Critical dimension metrology, Photomasks, Data integration, Integrated modeling, Photoresist processing

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71220W (2008) https://doi.org/10.1117/12.801526
KEYWORDS: Optical proximity correction, Optical lithography, Etching, Double patterning technology, Process modeling, Photomasks, Semiconducting wafers, Computer simulations, Tolerancing, Manufacturing

Proceedings Article | 2 April 2008 Paper
Proceedings Volume 6924, 69243G (2008) https://doi.org/10.1117/12.772902
KEYWORDS: Optical proximity correction, Data modeling, Scanning electron microscopy, Computer simulations, Calibration, Performance modeling, Resolution enhancement technologies, Semiconducting wafers, Lithography, Wafer-level optics

Proceedings Article | 7 March 2008 Paper
Chandra Sarma, Allen Gabor, Scott Halle, Henning Haffner, Klaus Herold, Len Tsou, Helen Wang, Haoren Zhuang
Proceedings Volume 6924, 692429 (2008) https://doi.org/10.1117/12.772985
KEYWORDS: Etching, Optical lithography, Double patterning technology, Tolerancing, Image processing, Photomasks, Lithography, Logic devices, Semiconducting wafers, Oxides

Showing 5 of 9 publications
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