Mr. Klaus Herold
at Infineon Technologies North America Corp
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Calibration, Etching, Photomasks, Optical proximity correction, Critical dimension metrology, Reactive ion etching, Photoresist processing, Semiconducting wafers, Process modeling

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Data modeling, Etching, Integrated modeling, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Data integration, Instrument modeling

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Optical lithography, Etching, Manufacturing, Computer simulations, Photomasks, Double patterning technology, Optical proximity correction, Semiconducting wafers, Tolerancing, Process modeling

PROCEEDINGS ARTICLE | April 2, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Calibration, Computer simulations, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Performance modeling, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Image processing, Photomasks, Double patterning technology, Logic devices, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Logic, Manufacturing, Printing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Tolerancing, Standards development

Showing 5 of 9 publications
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