Klaus Herold
at Infineon Technologies North America Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Calibration, Etching, Photomasks, Optical proximity correction, Critical dimension metrology, Reactive ion etching, Photoresist processing, Semiconducting wafers, Process modeling

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Data modeling, Etching, Integrated modeling, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Data integration, Instrument modeling

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Optical lithography, Etching, Manufacturing, Computer simulations, Photomasks, Double patterning technology, Optical proximity correction, Semiconducting wafers, Tolerancing, Process modeling

Proceedings Article | 2 April 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Calibration, Computer simulations, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Performance modeling, Resolution enhancement technologies

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Image processing, Photomasks, Double patterning technology, Logic devices, Semiconducting wafers, Tolerancing

Showing 5 of 9 publications
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