Dr. Klaus Kornitzer
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Monochromatic aberrations, Optical design, Reticles, Polarization, Imaging systems, Scanners, Semiconducting wafers, Overlay metrology, Fiber optic illuminators

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Reticles, Imaging systems, Control systems, Distortion, Photomasks, Critical dimension metrology, Semiconducting wafers, Optics manufacturing, Binary data, Phase shifts

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