KrF lithography is nowadays widely used for volume production spanning many device layers ranging from front-end 90nm to mid- & back-end layers in 45nm and 32nm ITRS imaging nodes. In this paper we discuss the addition of the new high-NA XT:1000H TWINSCAN(TM)scanning exposure tool to the KrF portfolio. We discuss advances in the system design and elaborate on its imaging and overlay performance. It is shown that stable tool performance supports 80nm resolution volume manufacturing. Extendibility with polarization towards sub-80nm is also addressed.
As the semiconductor industry looks into the near future to extend manufacturing beyond 100nm, a new optical lithography system was developed by ASML. To achieve the aggressive industry roadmap and enable high volume manufacturing of sub 100nm resolutions at low k1 requires a number of challenges to be overcome. This paper reviews the design, system performance and measurements of a High NA, Dual stage 193nm TWINSCAN system planned for high volume manufacturing for 80nm applications. The overall system capability to effectively measure and control to a high precision the various attributes upon process control necessary for adequate CD control, in the low k1 regime will be shown. This paper will discuss the needed imaging control and the requirement for an extremely stable and matured platform. The system's dynamic, focus, leveling and dose delivery performance will be shown. Additionally, the automated control features of the optical system will be shown that enable the use of the various resolution enhancement techniques (RET) currently under development. The ability to optimize imaging performance with the control and flexibility in the pupil formation optics will be discussed. Finally, experimental results of an in-situ measurement technique with automated feedback control to optimize projection lens aberrations, which has a direct impact to imaging fidelity, will be shown. In summary, the lithographic system functionality and performance needed to achieve 80nm volume manufacturing will be presented.