Dr. Klaus W. Lowack
at Siemens AG
SPIE Involvement:
Publications (5)

Proceedings Article | 24 March 2006 Paper
Patrick Naulleau, Kim Dean, Klaus Lowack
Proceedings Volume 6151, 61512T (2006) https://doi.org/10.1117/12.657001
KEYWORDS: Extreme ultraviolet, Data modeling, Extreme ultraviolet lithography, Optics manufacturing, Contrast transfer function, Wavefronts, Photomasks, Electroluminescence, Lithography, Cadmium

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6151, 61512U (2006) https://doi.org/10.1117/12.657683
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Real-time computing, Photoresist materials, Lithography, Photoresist developing, Contamination, Line edge roughness, Reticles

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599343
KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Multilayers, Printing, Scanning electron microscopy, Cadmium, Extreme ultraviolet lithography, Binary data, Imaging systems

Proceedings Article | 4 May 2005 Paper
Wolf-Dieter Domke, Karl Kragler, Marion Kern, Klaus Lowack, Oliver Kirch, Michele Bertolo
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599543
KEYWORDS: Extreme ultraviolet, Polymers, Extreme ultraviolet lithography, Spectroscopy, Synchrotrons, Ions, Chromatography, Diffusion, Molecules, 193nm lithography

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569289
KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Reflectors, Cadmium, Critical dimension metrology, Photoresist materials, Scanning electron microscopy

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