Dr. Klaus W. Lowack
at Siemens AG
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Reticles, Contamination, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Real-time computing, Photoresist developing

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Cadmium, Data modeling, Wavefronts, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Contrast transfer function, Optics manufacturing

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Multilayers, Cadmium, Imaging systems, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Binary data

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Polymers, Spectroscopy, Molecules, Ions, Diffusion, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Chromatography, 193nm lithography

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reflectors, Multilayers, Cadmium, Scanning electron microscopy, Photoresist materials, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

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