Klaus Simon
Director at Nomis Development GmbH
SPIE Involvement:
Publications (8)

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69241W (2008) https://doi.org/10.1117/12.773260
KEYWORDS: Scanners, Reticles, Semiconducting wafers, Critical dimension metrology, Manufacturing, Lithography, Etching, Photomasks, Imaging systems, Optimization (mathematics)

Proceedings Article | 1 July 2002 Paper
Michael Van de Moosdijk, Ennos Van den Brink, Klaus Simon, Alexander Friz, Geoffrey Phillipps, Richard Travers, Erik Raaymakers
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472358
KEYWORDS: Semiconducting wafers, Head, Metrology, Reticles, Calibration, Distortion, Deep ultraviolet, Magnetism, Lithography, Interferometers

Proceedings Article | 25 June 1999 Paper
Olga Vladimirsky, Niru Dandekar, Wenlong Jiang, Quinn Leonard, Klaus Simon, Srinivas Bollepalli, Yuli Vladimirsky, James Taylor
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351161
KEYWORDS: Photomasks, Lithography, X-ray lithography, Diffraction, X-rays, Opacity, Synchrotrons, Near field diffraction, Photoresist processing, Printing

Proceedings Article | 25 June 1999 Paper
Quinn Leonard, Jaz Bansel, Lei Yang, Olga Vladimirsky, Srinivas Bollepalli, Mumit Khan, Yuli Vladimirsky, Franco Cerrina, James Taylor, Klaus Simon, Lynn Rathbun, Richard Tiberio
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351147
KEYWORDS: Photomasks, X-rays, Gold, Etching, X-ray lithography, Photoresist materials, Lithography, Silicon, Electron beam lithography, Scanning electron microscopy

Proceedings Article | 25 June 1999 Paper
Robert Selzer, John Heaton, Yuli Vladimirsky, Klaus Simon
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351164
KEYWORDS: X-ray lithography, X-rays, System integration, Semiconducting wafers, Manufacturing, X-ray sources, Photomasks, Plasma, Synchrotrons, Defense and security

Showing 5 of 8 publications
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