Dr. Koen D'Have
at IMEC
SPIE Involvement:
Author
Publications (23)

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Optical lithography, Etching, Metals, Scanners, Copper, Double patterning technology, Optical alignment, Neodymium, Chemical mechanical planarization, Back end of line

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Light sources, Metrology, Optical lithography, Lithographic illumination, Polarization, Scanners, Control systems, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Metrology, Calibration, Scanners, 3D modeling, Scanning electron microscopy, Scatterometry, 3D metrology, Optical proximity correction, Scatter measurement

PROCEEDINGS ARTICLE | March 14, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Reticles, Scanners, Silicon, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, Optical alignment, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Reticles, Metrology, Scanners, Silicon, Extreme ultraviolet, Extreme ultraviolet lithography, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Reticles, Optical lithography, Data modeling, Calibration, Scanners, Control systems, Motion models, Semiconducting wafers, Overlay metrology, Current controlled current source

Showing 5 of 23 publications
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