Dr. Koen D'Havé
at imec
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Metrology, Optical lithography, Manufacturing, Scanning electron microscopy, Scatterometry, Extreme ultraviolet, Line width roughness, Optical simulations, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Stochastic processes, Overlay metrology

Proceedings Article | 8 October 2018 Presentation + Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Metrology, Optical lithography, Etching, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Optical lithography, Etching, Metals, Scanners, Copper, Double patterning technology, Optical alignment, Neodymium, Chemical mechanical planarization, Back end of line

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Light sources, Metrology, Optical lithography, Lithographic illumination, Polarization, Scanners, Control systems, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 5 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Metrology, Calibration, Scanners, 3D modeling, Scanning electron microscopy, Scatterometry, 3D metrology, Optical proximity correction, Scatter measurement

Showing 5 of 25 publications
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