Dr. Koen van Ingen Schenau
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (33)

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Electron beam lithography, Metrology, Deep ultraviolet, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 20 October 2016
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Scanners, Reflectivity, Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Wafer-level optics, Lithography, Reticles, Imaging systems, Scanners, Ions, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Neodymium, Semiconducting wafers

Proceedings Article | 16 November 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Wafer-level optics, Lithography, Reticles, Imaging systems, Scanners, Ions, Image resolution, Photomasks, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Neodymium, Semiconducting wafers, EUV optics

Proceedings Article | 4 September 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Reticles, Logic, Imaging systems, Nickel, Ions, Electroluminescence, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers

Showing 5 of 33 publications
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