Kohei Imoto
Senior Engineer at Canon Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Optical lithography, Capillaries, Ultraviolet radiation, Particles, Photomasks, Nanoimprint lithography, Manufacturing equipment, Semiconducting wafers, Mask cleaning

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Semiconductors, Lithography, Capillaries, Particles, Distortion, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers, Overlay metrology

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top