Dr. Kohei Machida
at Toyo Gosei Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Electron beam lithography, Light sources, Optical lithography, Polymers, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stochastic processes, Chemically amplified resists

Proceedings Article | 25 March 2019 Paper
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Polymers, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Head-mounted displays, Semiconducting wafers, Stochastic processes, Absorption, Chemically amplified resists

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Electron beams, Polymers, Molecules, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Absorption, Chemically amplified resists

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