Kohei Sekiguchi
Project Manager at IMEC
SPIE Involvement:
Author
Publications (8)

SPIE Journal Paper | 1 October 2010
JM3 Vol. 9 Issue 04
KEYWORDS: Line width roughness, Metrology, Extreme ultraviolet lithography, Image analysis, Line edge roughness, Lithography, Critical dimension metrology, Scanning electron microscopy, Photomasks, Edge detection

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Mathematical modeling, Lithography, Lithographic illumination, Scanning electron microscopy, Photoresist materials, Process control, Immersion lithography, Critical dimension metrology, Semiconducting wafers, Model-based design

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Scanning electron microscopy, Printing, Process control, Finite element methods, Immersion lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Temperature metrology

Proceedings Article | 16 April 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Metrology, Signal attenuation, Scanning electron microscopy, 3D metrology, Process control, Finite element methods, Critical dimension metrology, Semiconducting wafers, Signal detection

Proceedings Article | 16 April 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Metrology, Signal attenuation, Etching, Scanning electron microscopy, Process control, Finite element methods, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Showing 5 of 8 publications
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