Koichi Kido
at Rohm Co., Ltd.
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 11 March 2002
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical properties, Water, Particles, Hydrogen, Reflectivity, Chromium, Transmittance, Excimers, Scanning probe microscopy, Photoresist processing

Proceedings Article | 5 September 2001
Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII
KEYWORDS: Optical properties, Water, Particles, Reflectivity, Chromium, Transmittance, Excimers, Scanning probe microscopy, Photoresist processing, Industrial chemicals

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top