Mr. Koichi Matsumoto Profile

Koichi Matsumoto

General Manager at Nikon Corp

SPIE Involvement:

Author

Proceedings Article | 26 June 2003 Paper

Analysis of imaging performance degradation

Koichi Matsumoto, Tomoyuki Matsuyama, Shigeru Hirukawa

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485465

KEYWORDS: Birefringence, Wavefront aberrations, Chromatic aberrations, Wavefronts, Surface finishing, Optical lithography, Lithography, Spatial frequencies, Projection systems, Optical components

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Proceedings Article | 14 September 2001 Paper

Lens aberration control for fine patterning with PSM

Takehito Kudo, Shigeru Hirukawa, Toshiharu Nakashima, Koichi Matsumoto

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435769

KEYWORDS: Wavefront aberrations, Monochromatic aberrations, Optical lithography, Wavefronts, Photomasks, Resolution enhancement technologies, Computer simulations, Lens design, Control systems, Phase shifts

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Proceedings Article | 5 July 2000 Paper

Aberration averaging using point spread function for scanning projection systems

Hiroshi Ooki, Tomoya Noda, Koichi Matsumoto

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389044

KEYWORDS: Point spread functions, Wavefronts, Wavefront aberrations, Projection systems, Monochromatic aberrations, Image quality, Phase retrieval, Optical lithography, Deep ultraviolet, Distortion

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Proceedings Article | 21 September 1998 Paper

Lithography optics: its present and future

Koichi Matsumoto, Takashi Mori

Proceedings Volume 3482, (1998) https://doi.org/10.1117/12.322039

KEYWORDS: Calcium, Silica, Glasses, Excimer lasers, Refractor telescopes, Combined lens-mirror systems, Mirrors, Optical lithography, Optics manufacturing, Projection systems

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Proceedings Article | 29 June 1998 Paper

New projection optical system for beyond 150-nm patterning with KrF and ArF sources

Shigeru Hirukawa, Koichi Matsumoto, Kengo Takemasa

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310769

KEYWORDS: Projection systems, Optical lithography, Wafer-level optics, Resolution enhancement technologies, Error control coding, Lithography, Semiconducting wafers, Lithographic illumination, Photomasks, Lithium

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Proceedings Article | 17 May 1994 Paper

Innovative image formation: coherency controlled imaging

Koichi Matsumoto, Naomasa Shiraishi, Yuichiro Takeuchi, Shigeru Hirukawa

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175475

KEYWORDS: Photomasks, Imaging systems, Coherence imaging, Polarization, Coherence (optics), Projection systems, Image acquisition, Image quality, Optical lithography, Resolution enhancement technologies

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SPIE Journal Paper | 1 December 1992

Issues and method of designing lenses for optical lithography

Koichi Matsumoto, Tadao Tsuruta

OE, Vol. 31, Issue 12, (December 1992) https://doi.org/10.1117/12.10.1117/12.60024

KEYWORDS: Photomasks, Polarization, Monochromatic aberrations, Optical lithography, Image quality, Photoresist materials, Lens design, Optical design, Projection systems, Lenses

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Proceedings Article | 1 June 1990 Paper

Image quality of higher NA I-line projection lens

Shinichi Nakamura, Koichi Matsumoto, Kazuo Ushida, Masaomi Kameyama

Proceedings Volume 1264, (1990) https://doi.org/10.1117/12.20181

KEYWORDS: Lithography, Manufacturing, Image quality, Optics manufacturing, Image resolution, Optical lithography, Photoresist processing, Very large scale integration, Prototyping, Projection systems

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Showing 5 of 8 publications

Conference Committee Involvement (6)

Optical Microlithography XXI

26 February 2008 | San Jose, California, United States

Optical Microlithography XX

27 February 2007 | San Jose, California, United States

Optical Microlithography XIX

21 February 2006 | San Jose, California, United States

Optical Microlithography XVIII

1 March 2005 | San Jose, California, United States

Optical Microlithography XVII

24 February 2004 | Santa Clara, California, United States

Showing 5 of 6 Conference Committees

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