Dr. Koichi Misumi
at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Microelectromechanical systems, Optical lithography, Argon, Polymers, Coating, Photoresist materials, Epoxies, Semiconducting wafers, Antimony, Photoresist developing

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Packaging, Semiconductors, Gold, Lithography, Metals, Copper, Photoresist materials, Plating, Semiconducting wafers, Photoresist developing

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