Koichi Yatsuda
Group Leader at TEL
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 20 March 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Optical lithography, Polymethylmethacrylate, Etching, Image processing, Manufacturing, Ecosystems, Line width roughness, Directed self assembly, Line edge roughness, Semiconducting wafers

Proceedings Article | 27 March 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Polymethylmethacrylate, Etching, Manufacturing, Ecosystems, Directed self assembly, High volume manufacturing, Manufacturing equipment, Thin film coatings, Semiconducting wafers

Proceedings Article | 29 March 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Polymethylmethacrylate, Etching, Polymers, Materials processing, Manufacturing, Inspection, Ecosystems, Directed self assembly, Picosecond phenomena, Semiconducting wafers

Proceedings Article | 29 March 2013
Proc. SPIE. 8685, Advanced Etch Technology for Nanopatterning II
KEYWORDS: Optical lithography, Etching, Ions, Chemistry, Magnetism, Ion beams, Wet etching, Plasma etching, Tantalum, Plasma

Proceedings Article | 21 March 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Polymethylmethacrylate, Etching, Polymers, Silicon, Directed self assembly, Chemical analysis, Picosecond phenomena, Line edge roughness, Semiconducting wafers

Proceedings Article | 17 March 2012
Proc. SPIE. 8328, Advanced Etch Technology for Nanopatterning
KEYWORDS: Etching, Electrodes, Polymers, Ions, Silicon, Photoresist materials, Extreme ultraviolet, Line width roughness, Photoresist processing, Plasma

Showing 5 of 10 publications
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