Mr. Koichiro Tsujita
General Manager at Canon Inc
SPIE Involvement:
Author
Publications (39)

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Etching, Metals, Computer programming, Scanning electron microscopy, Photomasks, Logic devices, Source mask optimization

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Logic, Optical lithography, Etching, Photomasks, Double patterning technology, Source mask optimization, Optical proximity correction, Picosecond phenomena, Neodymium, Fiber optic illuminators

PROCEEDINGS ARTICLE | September 16, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Databases, Image processing, Manufacturing, Scanning electron microscopy, Photomasks, Double patterning technology, Optical proximity correction, Critical dimension metrology, Optics manufacturing

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Logic, Etching, Photomasks, Double patterning technology, Source mask optimization, Optical proximity correction, Convolution, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Calibration, Image processing, Manufacturing, Photomasks, Field effect transistors, Double patterning technology, Device simulation

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Logic, Optical lithography, Etching, Transmission electron microscopy, Photomasks, Double patterning technology, Source mask optimization, Optical proximity correction, Neodymium, Semiconducting wafers

Showing 5 of 39 publications
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