Mr. Koji Ichimura Profile

Koji Ichimura

Manager

SPIE Involvement:

Conference Program Committee | Author

Proceedings Article | 22 November 2023 Presentation

Ultimate resolution challenge for high-precision EUV mask by using MBMW technology

Shingo Yoshikawa, Tsukasa Abe, Yukihiro Fujimura, Mei Ebisawa, Izumi Hotei, Issei Sakai, Masataka Yamaji, Yasutaka Morikawa, Tatsuya Tomita, Koji Ichimura, Naoya Hayashi

Proceedings Volume PC12751, PC127510U (2023) https://doi.org/10.1117/12.2688952

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Semiconductor manufacturing, Photomasks, Photomask technology, Manufacturing, Lithography, Electron beams

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Proceedings Article | 29 September 2023 Paper

Development of nanoimprint templates for dual damascene processing

Hisayoshi Watanabe, Takaharu Nagai, Koji Ichimura

Proceedings Volume 12915, 1291504 (2023) https://doi.org/10.1117/12.2684687

KEYWORDS: Nanoimprint lithography, Scanning electron microscopy, Overlay metrology, Fabrication, Lithography, Electron beam lithography, Design and modelling, 3D acquisition, Semiconductors

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Proceedings Article | 30 April 2023 Presentation

Development of nanoimprint templates for dual damascene processing

Takaharu Nagai, Hisayoshi Watanabe, Koji Ichimura

Proceedings Volume PC12497, PC1249708 (2023) https://doi.org/10.1117/12.2661643

KEYWORDS: Nanoimprint lithography, Lithography, Metals, Semiconductors, Extreme ultraviolet lithography, Extreme ultraviolet, Double patterning technology, 3D acquisition

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Proceedings Article | 1 December 2022 Presentation + Paper

Characteristics of fine feature hole templates for nanoimprint lithography toward 2nm and beyond

Koji Ichimura, Koji Yoshida, Hideki Cho, Ryugo Hikichi, Masaaki Kurihara

Proceedings Volume 12293, 122930F (2022) https://doi.org/10.1117/12.2643250

KEYWORDS: Nanoimprint lithography, Critical dimension metrology, Overlay metrology, Image processing, Fabrication, Scanning electron microscopy, Semiconductor manufacturing, Quartz, Lithography, Semiconductors

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Proceedings Article | 15 September 2022 Presentation

Development of nano-imprint lithography template for fine feature hole layers of next generation devices

Koji Ichimura

Proceedings Volume PC12325, PC1232509 (2022) https://doi.org/10.1117/12.2656138

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Proceedings Article | 22 February 2021 Presentation

Nanoimprint template development by new fabrication method and its application

Koji Ichimura, Takaharu Nagai, Kouji Yoshida, Hisayoshi Watanabe, Naoya Hayashi

Proceedings Volume 11610, 116100B (2021) https://doi.org/10.1117/12.2584791

KEYWORDS: Nanoimprint lithography, Lithography, Double patterning technology, Photomasks, Overlay metrology, Fabrication, Ultraviolet radiation, Semiconductors, Semiconducting wafers, Polymers

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Proceedings Article | 12 October 2018 Presentation

Sub-15nm template fabrication with multi-beam mask writer (Conference Presentation)

Koji Ichimura, Koichi Kanno, Masaaki Kurihara, Naoya Hayashi

Proceedings Volume 10810, 108100G (2018) https://doi.org/10.1117/12.2501754

KEYWORDS: Nanoimprint lithography, Photomasks, Lithography, Process control

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Proceedings Article | 19 March 2018 Presentation

Fabrication of full-field 1z nm template using multi-beam mask writer (Conference Presentation)

Koji Ichimura, Koichi Kanno, Masaaki Kurihara, Naoya Hayashi

Proceedings Volume 10584, 105840P (2018) https://doi.org/10.1117/12.2299778

KEYWORDS: Nanoimprint lithography, Photomasks, Lithography, Semiconductors

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Proceedings Article | 27 April 2017 Presentation

Development of nanoimprint lithography templates for the contact hole layer application (Conference Presentation)

Koji Ichimura, Ryugo Hikichi, Saburo Harada, Koichi Kanno, Masaaki Kurihara, Naoya Hayashi

Proceedings Volume 10144, 101440D (2017) https://doi.org/10.1117/12.2263460

KEYWORDS: Printing, Current controlled current source, Nanoimprint lithography, Optical lithography, Lithography, Semiconductors, Electron beam lithography, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers

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SPIE Journal Paper | 5 February 2016

Development of nanoimprint lithography templates toward high-volume manufacturing

Koji Ichimura, Kouji Yoshida, Saburo Harada, Takaharu Nagai, Masaaki Kurihara, Naoya Hayashi

JM3, Vol. 15, Issue 02, 021006, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021006

KEYWORDS: Nanoimprint lithography, High volume manufacturing, Image processing, Critical dimension metrology, Lithography, Semiconductors, Semiconducting wafers, Photomasks, Ultraviolet radiation, Liquids

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Proceedings Article | 19 March 2015 Paper

HVM readiness of nanoimprint lithography templates: defects, CD, and overlay

Koji Ichimura, Kouji Yoshida, Saburo Harada, Takaharu Nagai, Masaaki Kurihara, Naoya Hayashi

Proceedings Volume 9423, 94230D (2015) https://doi.org/10.1117/12.2175483

KEYWORDS: Nanoimprint lithography, Distortion, Image processing, Semiconducting wafers, Overlay metrology, Lithography, Etching, High volume manufacturing, Semiconductors, Photomasks

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Showing 5 of 11 publications

Conference Committee Involvement (2)

Novel Patterning Technologies 2024

26 February 2024 | San Jose, California, United States

Novel Patterning Technologies 2023

27 February 2023 | San Jose, California, United States

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