Koji Kaneyama
Lithography Resist Group Member at SCREEN Holdings Co., Ltd.
SPIE Involvement:
Publications (29)

Proceedings Article | 27 March 2017 Paper
Masahiko Harumoto, Harold Stokes, Yuji Tanaka, Koji Kaneyama, Chalres Pieczulewski, Masaya Asai, Maxime Argoud, Isabelle Servin, Gaëlle Chamiot-Maitral, Guillaume Claveau, Raluca Tiron, Ian Cayrefourcq
Proceedings Volume 10146, 101461X (2017) https://doi.org/10.1117/12.2257945
KEYWORDS: Directed self assembly, Optical lithography, Thin film coatings, Line width roughness, Annealing, Oxygen, Scanning electron microscopy, Atmospheric modeling, Semiconducting wafers, Polymers

Proceedings Article | 27 March 2017 Paper
Proceedings Volume 10143, 101431Z (2017) https://doi.org/10.1117/12.2259994
KEYWORDS: Annealing, Extreme ultraviolet, Line width roughness, Semiconducting wafers, Standards development, Extreme ultraviolet lithography, Lithography, Thin film coatings, Wafer testing, Metrology

Proceedings Article | 1 April 2016 Paper
Proceedings Volume 9777, 97770O (2016) https://doi.org/10.1117/12.2219925
KEYWORDS: Lithography, Semiconducting wafers, Directed self assembly, Image processing, Scanning electron microscopy, Etching, Immersion lithography, Optical lithography, Annealing, Distance measurement

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 977628 (2016) https://doi.org/10.1117/12.2218947
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Thin film coatings, Photoresist processing, Bridges, Semiconducting wafers, Wafer-level optics, Scanning electron microscopy

Proceedings Article | 20 March 2015 Paper
Proceedings Volume 9425, 94250G (2015) https://doi.org/10.1117/12.2085277
KEYWORDS: Semiconducting wafers, Coating, High speed cameras, Extreme ultraviolet, Photoresist materials, Photoresist processing, Video, Silicon, Content addressable memory, Lithium

Showing 5 of 29 publications
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