Koji Kikuchi
at Univ of California Berkeley
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Diffraction, Phase shifting, Finite-difference time-domain method, Polarization, Etching, Glasses, Dielectrics, Photomasks, Electromagnetic simulation, Phase shifts

Proceedings Article | 28 March 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Monochromatic aberrations, Etching, Manufacturing, Design for manufacturing, Photomasks, Computer aided design, Process modeling, Device simulation, Chemical mechanical planarization

Proceedings Article | 21 February 2007
Proc. SPIE. 6501, Sensors, Cameras, and Systems for Scientific/Industrial Applications VIII
KEYWORDS: Semiconductors, Signal to noise ratio, Finite-difference time-domain method, Electrons, Silicon, Photodiodes, Computer simulations, Image sensors, Charge-coupled devices, CCD image sensors

Proceedings Article | 7 June 2004
Proc. SPIE. 5301, Sensors and Camera Systems for Scientific, Industrial, and Digital Photography Applications V
KEYWORDS: Lithography, Optical lithography, Image processing, Ions, Diffusion, Monte Carlo methods, Image sensors, CCD image sensors, Photoresist processing, Device simulation

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Optical lithography, Quartz, Chromium, Fiber reinforced polymers, Photomasks, Critical dimension metrology, Phase shifts

Proceedings Article | 12 July 2002
Proc. SPIE. 4692, Design, Process Integration, and Characterization for Microelectronics
KEYWORDS: Lithium, Statistical analysis, Microelectronics, Logic devices, Optical proximity correction, Picosecond phenomena, Optical calibration

Showing 5 of 9 publications
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