Prof. Koji Nakamae
at Osaka Univ
SPIE Involvement:
Author
Publications (18)

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Metals, Copper, Dielectrics, Reliability, Resistance, Electron beam direct write lithography, Dielectric breakdown

PROCEEDINGS ARTICLE | May 28, 2013
Proc. SPIE. 8749, Quantum Information and Computation XI
KEYWORDS: Clocks, Detection and tracking algorithms, Databases, Ions, Computing systems, Quantum information, Quantum communications, Device simulation, Quantum computing, Quantum circuits

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Copper, Dielectrics, Reliability, Photomasks, Maskless lithography, Electron beam direct write lithography, Dielectric breakdown

SPIE Journal Paper | January 1, 2011
JM3 Vol. 10 Issue 1
KEYWORDS: Manufacturing, Tolerancing, Optical proximity correction, Design for manufacturability, Failure analysis, Optics manufacturing, Capacitance, Optical calibration, Clocks, Lithography

PROCEEDINGS ARTICLE | April 3, 2010
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Clocks, Manufacturing, Capacitance, Optical proximity correction, Data conversion, Tolerancing, Integrated circuit design, Failure analysis, Electronic design automation, Design for manufacturability

PROCEEDINGS ARTICLE | April 1, 2010
Proc. SPIE. 7637, Alternative Lithographic Technologies II
KEYWORDS: Lithography, Electron beams, Photomasks, Beam shaping, Double patterning technology, Maskless lithography, Computer aided design, Electron beam direct write lithography, Semiconducting wafers, Vestigial sideband modulation

Showing 5 of 18 publications
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