Prof. Koji Nakamae
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Mathematical modeling, Signal to noise ratio, Data modeling, Image processing, Scanning electron microscopy, Image quality, Line width roughness, Image enhancement, Line edge roughness

SPIE Journal Paper | 20 December 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Overlay metrology, Scanning electron microscopy, Image segmentation, Sensors, Image processing, Semiconducting wafers, Detection and tracking algorithms, Electron beams, Signal to noise ratio, Lithography

Proceedings Article | 28 March 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Metals, Copper, Dielectrics, Reliability, Resistance, Electron beam direct write lithography, Dielectric breakdown

Proceedings Article | 28 May 2013
Proc. SPIE. 8749, Quantum Information and Computation XI
KEYWORDS: Clocks, Detection and tracking algorithms, Databases, Ions, Computing systems, Quantum information, Quantum communications, Device simulation, Quantum computing, Quantum circuits

Proceedings Article | 26 March 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Copper, Dielectrics, Reliability, Photomasks, Maskless lithography, Electron beam direct write lithography, Dielectric breakdown

SPIE Journal Paper | 1 January 2011
JM3 Vol. 10 Issue 1
KEYWORDS: Manufacturing, Tolerancing, Optical proximity correction, Design for manufacturability, Failure analysis, Optics manufacturing, Capacitance, Optical calibration, Clocks, Lithography

Showing 5 of 20 publications
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