Dr. Koji Nozaki
Director at Fujitsu Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Polymethylmethacrylate, Line edge roughness, Polymers, Resolution enhancement technologies, Etching, Oxides, Lithography, Photoresist processing, Scanning electron microscopy, Photography

Proceedings Article | 23 June 2000
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Dry etching, Lithography, Chemically amplified resists, Deep ultraviolet, Etching, Photomicroscopy, Plasma, Electron beams, Scanning electron microscopy, Optical lithography

Proceedings Article | 9 June 1995
Proc. SPIE. 2438, Advances in Resist Technology and Processing XII
KEYWORDS: Contamination, Ion exchange, Chemically amplified resists, Ions, Excimer lasers, Spectroscopy, Quantum efficiency, Transmittance, Absorption, Deep ultraviolet

Proceedings Article | 9 June 1995
Proc. SPIE. 2438, Advances in Resist Technology and Processing XII
KEYWORDS: Coating, Polymers, Lithography, Standards development, Chemically amplified resists, Photoresist processing, Resistance, Transparency, Silicon, Transmittance

Proceedings Article | 1 June 1992
Proc. SPIE. 1672, Advances in Resist Technology and Processing IX
KEYWORDS: Etching, Polymers, Resistance, Excimers, Lithography, Dry etching, Polymethylmethacrylate, Silicon, Argon, Excimer lasers

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