Koki Kuriyama
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 20 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Photomasks, Vestigial sideband modulation, Nanoimprint lithography, Manufacturing, Ultraviolet radiation, Line edge roughness, Image processing, Optical lithography, Etching, Quartz

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Photomasks, Vestigial sideband modulation, Nanoimprint lithography, Mask making, Manufacturing, Quartz, Ultraviolet radiation, Materials processing, Semiconducting wafers, Line edge roughness

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Photomasks, Vestigial sideband modulation, Data conversion, Manufacturing, Data modeling, Standards development, Data storage, Inspection, Raster graphics, Computing systems

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Photomasks, Data conversion, Manufacturing, Electronic design automation, Inspection, Nanotechnology, Data processing, Optical proximity correction, Resolution enhancement technologies, Printing

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Data conversion, Vestigial sideband modulation, Photomasks, Optical proximity correction, Electronic design automation, Resolution enhancement technologies, Printing, Standards development, Inspection, Semiconductors

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Manufacturing, Photomasks, Data conversion, Standards development, Electronic design automation, Reticles, Software development, Databases, Printing, Data communications

Showing 5 of 13 publications
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