Koki Kuriyama
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 20 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Optical lithography, Etching, Quartz, Image processing, Ultraviolet radiation, Manufacturing, Photomasks, Nanoimprint lithography, Line edge roughness, Vestigial sideband modulation

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Quartz, Ultraviolet radiation, Materials processing, Manufacturing, Photomasks, Mask making, Nanoimprint lithography, Line edge roughness, Semiconducting wafers, Vestigial sideband modulation

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Data modeling, Data storage, Manufacturing, Inspection, Computing systems, Photomasks, Raster graphics, Data conversion, Standards development, Vestigial sideband modulation

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Nanotechnology, Manufacturing, Inspection, Printing, Data processing, Photomasks, Optical proximity correction, Data conversion, Electronic design automation, Resolution enhancement technologies

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Semiconductors, Inspection, Printing, Photomasks, Optical proximity correction, Data conversion, Electronic design automation, Standards development, Vestigial sideband modulation, Resolution enhancement technologies

Showing 5 of 13 publications
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