Dr. Kokoro Kato
Project Manager/Sales Representative at Nihon Synopsys GK
SPIE Involvement:
Conference Chair | Conference Program Committee | Author | Editor
Publications (29)

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Manufacturing, Time metrology, Software development, Photomasks, Optical proximity correction, Algorithm development, Process modeling

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Nanotechnology, Mirrors, Data processing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Electronic design automation, Fuzzy logic

Proceedings Article | 30 June 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Semiconductors, Nanotechnology, Manufacturing, Inspection, Software development, Photomasks, Extreme ultraviolet, Optical proximity correction, Mask making, Standards development

Showing 5 of 29 publications
Conference Committee Involvement (8)
Photomask Japan 2014
15 April 2014 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XX
16 April 2013 | Yokohama, Japan
Photomask Japan 2012
17 April 2012 | Yokohama, Japan
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Showing 5 of 8 Conference Committees
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