Kong Son
at Seagate Technology LLC
SPIE Involvement:
Publications (8)

Proceedings Article | 4 November 2005 Paper
Luke T. Hsu, C.H. Ho, C. C. Lin, Vincent Hsu, Ellison Chen, Paul Yu, Kong Son
Proceedings Volume 5992, 599207 (2005) https://doi.org/10.1117/12.632108
KEYWORDS: Inspection, Contamination, Deep ultraviolet, Ultraviolet radiation, Reticles, Photomask technology, Image resolution, Sensors, Stars, Photomasks

Proceedings Article | 4 November 2005 Paper
Jerry Huang, Lan-Hsin Peng, Chih-Wei Chu, Kaustuve Bhattacharyya, Ben Eynon, Farzin Mirzaagha, Tony Dibiase, Kong Son, Jackie Cheng, Ellison Chen, Den Wang
Proceedings Volume 5992, 599206 (2005) https://doi.org/10.1117/12.632039
KEYWORDS: Photomasks, Sensors, Inspection, Lithography, Semiconducting wafers, Defect inspection, Defect detection, Crystals, Detector development, Deep ultraviolet

Proceedings Article | 28 June 2005 Paper
Paul Yu, Vincent Hsu, Ellison Chen, Rick Lai, Kong Son, Weimin Ma, Peter Chang, Jackie Chen
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617488
KEYWORDS: Inspection, Reticles, Defect detection, Photomasks, Defect inspection, Manufacturing, Process engineering, Sensors, Image processing

Proceedings Article | 6 December 2004 Paper
Kaustuve Bhattacharyya, Kong Son, Benjamin Eynon, Dadi Gudmundsson, Carmen Jaehnert, Doris Uhlig
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568874
KEYWORDS: Photomasks, Reticles, Inspection, Semiconducting wafers, Lithography, Failure analysis, Data modeling, Statistical analysis, 193nm lithography, Stochastic processes

Proceedings Article | 28 May 2004 Paper
W. Shieh, William Chou, Chuen-Huei Yang, J. Wu, Noah Chen, Shih Yen, Tony Hsu, Steve Tuan, Doris Chang, Maciej Rudzinski, Lantian Wang, Kong Son
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544243
KEYWORDS: Semiconducting wafers, Reticles, Inspection, Photomasks, Lithography, Wafer inspection, Resolution enhancement technologies, Scanning electron microscopy, Manufacturing, Critical dimension metrology

Showing 5 of 8 publications
Conference Committee Involvement (3)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
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