Kong Son
at Seagate Technology LLC
SPIE Involvement:
Conference Program Committee | Author
Publications (8)

Proceedings Article | 4 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Contamination, Stars, Deep ultraviolet, Sensors, Ultraviolet radiation, Inspection, Image resolution, Photomasks, Photomask technology

Proceedings Article | 4 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Defect detection, Deep ultraviolet, Sensors, Crystals, Inspection, Detector development, Photomasks, Semiconducting wafers, Defect inspection

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Reticles, Defect detection, Sensors, Image processing, Manufacturing, Inspection, Photomasks, Process engineering, Defect inspection

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Statistical analysis, Data modeling, Inspection, Photomasks, Semiconducting wafers, Failure analysis, Stochastic processes, 193nm lithography

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Reticles, Manufacturing, Inspection, Scanning electron microscopy, Wafer inspection, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 8 publications
Conference Committee Involvement (3)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
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