Konrad Knapp
Business Segment Manager at Linde AG
SPIE Involvement:
Conference Program Committee | Author
Publications (29)

Proceedings Article | 15 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Electron beam lithography, Etching, Dry etching, Manufacturing, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Mask making

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Polarization, Birefringence, Optical properties, Crystals, Calcium, Laser irradiation, Excimer lasers, Laser crystals, Laser optics, Temperature metrology

Proceedings Article | 4 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Antireflective coatings, Reflection, Opacity, Etching, Interfaces, Inspection, Photomasks, Binary data, Phase shifts

Proceedings Article | 5 October 2005
Proc. SPIE. 5963, Advances in Optical Thin Films II
KEYWORDS: Oxides, Lithography, Phase shifting, Reflection, Etching, Dry etching, Inspection, Photomasks, Tantalum, Phase shifts

Proceedings Article | 16 June 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Multilayers, Metrology, Etching, Dry etching, Inspection, Reflectivity, Process control, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Multilayers, Metrology, Etching, Dry etching, Inspection, Reflectivity, CCD cameras, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Showing 5 of 29 publications
Conference Committee Involvement (1)
Photomask Technology
1 October 2002 | Monterey, CA, United States
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