Kosta S. Selinidis
ILT,OPC,RET Corporate Applications Enineer, Staff at Synopsys Inc
SPIE Involvement:
Publications (22)

Proceedings Article | 5 April 2019 Presentation + Paper
Proceedings Volume 10962, 109620P (2019) https://doi.org/10.1117/12.2515156
KEYWORDS: Extreme ultraviolet, Photomasks, Stochastic processes, Lithography, Extreme ultraviolet lithography, 3D modeling, Optical lithography, Manufacturing, EUV optics, Electromagnetism

Proceedings Article | 20 March 2018 Paper
Proceedings Volume 10587, 105870M (2018) https://doi.org/10.1117/12.2299375
KEYWORDS: Photomasks, Lithography, Optical lithography, 3D modeling, Optical proximity correction, Calibration, Photoresist processing, Manufacturing, Computer simulations, Source mask optimization

Proceedings Article | 24 March 2017 Presentation + Paper
Proceedings Volume 10147, 101470Q (2017) https://doi.org/10.1117/12.2257962
KEYWORDS: 3D modeling, Optical proximity correction, Optical lithography, Data modeling, Computational lithography, Optimization (mathematics), Photoresist processing, Source mask optimization, Scanning electron microscopy

Proceedings Article | 14 October 2011 Paper
Kosta Selinidis, Chris Jones, Gary Doyle, Laura Brown, Joseph Imhof, Dwayne LaBrake, Douglas Resnick, S. Sreenivasan
Proceedings Volume 8166, 816627 (2011) https://doi.org/10.1117/12.898865
KEYWORDS: Photomasks, Chromium, Etching, Lithography, Semiconductors, Semiconducting wafers, Particles, Optical lithography, Optical alignment, Inspection

SPIE Journal Paper | 1 October 2011
Kosta Selinidis, Cynthia Brooks, Gary Doyle, Laura Brown, Chris Jones, Joseph Imhof, Dwayne LaBrake, Douglas Resnick, S. Sreenivasan
JM3, Vol. 10, Issue 04, 043005, (October 2011) https://doi.org/10.1117/12.10.1117/1.3646523
KEYWORDS: Photomasks, Chromium, Lithography, Etching, Electron beam lithography, Semiconductors, Semiconducting wafers, Inspection, Optical alignment, Silica

Showing 5 of 22 publications
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