Kosta S. Selinidis
ILT,OPC,RET Corporate Applications Enineer, Staff at Synopsys Inc
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 5 April 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Optical lithography, Manufacturing, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetism, Stochastic processes, EUV optics

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Calibration, Manufacturing, Computer simulations, 3D modeling, Photomasks, Source mask optimization, Optical proximity correction, Photoresist processing

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Data modeling, 3D modeling, Scanning electron microscopy, Source mask optimization, Computational lithography, Optical proximity correction, Optimization (mathematics), Photoresist processing

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Semiconductors, Lithography, Optical lithography, Etching, Particles, Inspection, Chromium, Photomasks, Optical alignment, Semiconducting wafers

SPIE Journal Paper | 1 October 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Photomasks, Chromium, Lithography, Etching, Electron beam lithography, Semiconductors, Semiconducting wafers, Inspection, Optical alignment, Silica

Showing 5 of 22 publications
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