Dr. Kostas Adam
Director of Engineering at Mentor, a Siemens Business
SPIE Involvement:
Senior status | Author
Publications (50)

Proceedings Article | 4 April 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Coastal modeling, Cadmium, Data modeling, Calibration, Neural networks, Machine learning, Optical proximity correction, Systems modeling, Process modeling

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Logic, Visualization, Error analysis, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Failure analysis, Stochastic processes

Proceedings Article | 18 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Lithography, Optical lithography, Computer simulations, 3D modeling, Photoresist materials, Finite element methods, Photoresist processing, Photoresist developing, Process modeling, Chemically amplified resists

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Wafer-level optics, Finite-difference time-domain method, Scanners, Projection systems, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, Electromagnetism, Systems modeling

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Scanners, Error analysis, Manufacturing, Wavefronts, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Tolerancing

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference

Showing 5 of 50 publications
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