Kosuke Ishikiriyama
at Intel Kabushiki Kaisha
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Optical lithography, Etching, Dry etching, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Ruthenium

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Optical lithography, Etching, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Mask making, Line edge roughness, Ruthenium

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