Kosuke Yamamoto
at Tokyo Electron Yamanashi Ltd.
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | April 1, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Optical lithography, Polymethylmethacrylate, Polymers, Error analysis, Computer simulations, Numerical analysis, Directed self assembly, Double patterning technology, Picosecond phenomena, Critical dimension metrology

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Polymethylmethacrylate, Polymers, Particles, Error analysis, Computer simulations, Data acquisition, Directed self assembly, Picosecond phenomena, Critical dimension metrology, Tolerancing

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