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Kota Kobayashi
at Toppan Printing Co Ltd
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Publications (2)
Proceedings Article | 26 September 2019 Paper
Evaluation of neighborhood pattern matching algorithm in MPC processing
Proceedings Volume 11148, 111481K (2019) https://doi.org/10.1117/12.2538626
KEYWORDS: Process modeling, Manufacturing, Algorithm development, Software development, Photomasks, Optical proximity correction, Time metrology
Proceedings Article | 27 June 2019 Paper
MPC model sensitivity analysis: model ambit vs. correction runtime
Alex Zepka, John Valadez, Parikshit Kulkarni, Kohei Yanagisawa, Kota Kobayashi, Kiyoshi Kageyama
Proceedings Volume 11178, 1117808 (2019) https://doi.org/10.1117/12.2535707
KEYWORDS: Photomasks, Data modeling, Calibration, Metrology, Etching, Electrons, Lithography, Optical proximity correction, Cadmium, Semiconducting wafers
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