Dr. Kouji Yoshida
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Publications (10)

Proceedings Article | 1 December 2022 Presentation + Paper
Koji Ichimura, Koji Yoshida, Hideki Cho, Ryugo Hikichi, Masaaki Kurihara
Proceedings Volume 12293, 122930F (2022) https://doi.org/10.1117/12.2643250
KEYWORDS: Nanoimprint lithography, Critical dimension metrology, Overlay metrology, Image processing, Fabrication, Scanning electron microscopy, Semiconductor manufacturing, Quartz, Lithography, Semiconductors

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11610, 116100B (2021) https://doi.org/10.1117/12.2584791
KEYWORDS: Nanoimprint lithography, Lithography, Double patterning technology, Photomasks, Overlay metrology, Fabrication, Ultraviolet radiation, Semiconductors, Semiconducting wafers, Polymers

SPIE Journal Paper | 5 February 2016
JM3, Vol. 15, Issue 02, 021006, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021006
KEYWORDS: Nanoimprint lithography, High volume manufacturing, Image processing, Critical dimension metrology, Lithography, Semiconductors, Semiconducting wafers, Photomasks, Ultraviolet radiation, Liquids

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9423, 94230D (2015) https://doi.org/10.1117/12.2175483
KEYWORDS: Nanoimprint lithography, Distortion, Image processing, Semiconducting wafers, Overlay metrology, Lithography, Etching, High volume manufacturing, Semiconductors, Photomasks

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73790A (2009) https://doi.org/10.1117/12.824251
KEYWORDS: Chromium, Photomasks, Quartz, Surface roughness, Head-mounted displays, Scanning probe microscopy, Photoresist processing, Interfaces, Atomic force microscopy, Silicon

Showing 5 of 10 publications
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