Dr. Kouji Yoshida
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (8)

SPIE Journal Paper | 5 February 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Nanoimprint lithography, High volume manufacturing, Image processing, Critical dimension metrology, Lithography, Semiconductors, Semiconducting wafers, Photomasks, Ultraviolet radiation, Liquids

Proceedings Article | 19 March 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Semiconductors, Lithography, Etching, Image processing, Distortion, Photomasks, High volume manufacturing, Nanoimprint lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Quartz, Interfaces, Silicon, Surface roughness, Chromium, Atomic force microscopy, Photomasks, Scanning probe microscopy, Head-mounted displays, Photoresist processing

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Fabrication, Quartz, Silicon, Chromium, Control systems, Atomic force microscopy, Photomasks, Scanning probe microscopy, Head-mounted displays, Adhesives

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Metrology, Ultraviolet radiation, Diffusion, Image analysis, Atomic force microscopy, Scanning electron microscopy, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Metrology, Reflection, Spatial frequencies, Ultraviolet radiation, Inspection, Surface roughness, Atomic force microscopy, Scanning electron microscopy, Scatterometry

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top