Koutarou Sho
at Toshiba Corp
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Semiconductors, Lithography, Optical lithography, Lenses, Opacity, Etching, Metals, Scanners, Photoresist materials, Photomasks, Double patterning technology, Critical dimension metrology, Reactive ion etching, Semiconducting wafers, Anisotropic etching

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Silica, Etching, Scanning electron microscopy, Photomasks, Double patterning technology, Critical dimension metrology, Photoresist processing

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Chemical species, Polymers, Scanners, Line width roughness, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, Defect inspection

Proceedings Article | 1 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Lithographic illumination, Metals, Scanners, Photomasks, Logic devices, SRAF, Semiconducting wafers

Proceedings Article | 31 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Transparency, Etching, Materials processing, Reflectivity, Photomasks, Immersion lithography, Logic devices, Photoresist processing, System on a chip

Showing 5 of 13 publications
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