Dr. Kozo Ogino
at Fujitsu Semiconductor Ltd
SPIE Involvement:
Author
Publications (8)

SPIE Journal Paper | August 7, 2012
JM3 Vol. 11 Issue 3
KEYWORDS: Optical alignment, Electron beam direct write lithography, Electron beams, Overlay metrology, Control systems, Semiconducting wafers, Metals, Back end of line, Backscatter, Electron beam lithography

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Electron beam lithography, Electron beams, Backscatter, Metals, Control systems, Optical alignment, Electron beam direct write lithography, Photoresist processing, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beams, Logic, Modulation, Backscatter, Scattering, Laser scattering, Photomasks, Critical dimension metrology, Electron beam direct write lithography

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Optical lithography, Diffusion, Manufacturing, Scanning electron microscopy, Monte Carlo methods, High volume manufacturing, Photoresist processing, Beam analyzers, Chemically amplified resists

PROCEEDINGS ARTICLE | May 19, 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Semiconductors, Digital image processing, Graphics processing units, Manufacturing, Computing systems, Fourier transforms, Data processing, Distributed computing, Photomasks, Optical proximity correction

PROCEEDINGS ARTICLE | March 20, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Optical lithography, Scattering, Scanning electron microscopy, Photomasks, Maskless lithography, Data conversion, Semiconducting wafers

Showing 5 of 8 publications
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