CONFERENCE PROCEEDINGS
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Kozue Miura
at Nihon Entegris GK
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Publications (4)
Proceedings Article | 25 May 2022 Poster + Paper
Examining strategies to control gel-like defects in EUV patterning materials
Proceedings Volume 12055, 120550S (2022) https://doi.org/10.1117/12.2614019
KEYWORDS: Polymers, Particles, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, Coating, Optical lithography, Semiconducting wafers, Contamination control, Wafer testing
Proceedings Article | 23 March 2020 Paper
A novel filter screening methodology for Si hardmask materials in EUV lithography
Proceedings Volume 11326, 113261X (2020) https://doi.org/10.1117/12.2551644
KEYWORDS: Polymers, Silicon, Extreme ultraviolet lithography, Optical lithography, Coating, Extreme ultraviolet, Yield improvement, Etching, Lithography, Particles
Proceedings Article | 25 March 2019 Paper
Filter technology developments to address defectivity in leading-edge photoresists
Proceedings Volume 10960, 109601X (2019) https://doi.org/10.1117/12.2514974
KEYWORDS: Photoresist materials, Particles, Manufacturing, Metals, Adsorption, Filtering (signal processing), Optical lithography, Chemistry, Lithography, Extreme ultraviolet lithography
Proceedings Article | 13 March 2018 Paper
The intrinsic role of membrane morphology to reduce defectivity in advanced photochemicals
Tetsu Kohyama, Aiwen Wu, Kozue Miura, Yasushi Ohyashiki
Proceedings Volume 10586, 1058617 (2018) https://doi.org/10.1117/12.2297389
KEYWORDS: Polymers, Yield improvement, Lithography, Manufacturing, Semiconducting wafers, Industrial chemicals, Chromatography
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