Mrs. Krishnaparvathy Puthankovilakam Profile

Mrs. Krishnaparvathy Puthankovilakam

Doctoral Student at Ecole Polytechnique Federale de Lausanne

Publications (6)

PROCEEDINGS ARTICLE | February 27, 2017

Light fields behind microstructures: study of the Babinet-principle in the Fresnel regime

Proc. SPIE. 10120, Complex Light and Optical Forces XI

KEYWORDS: Diffraction, Modulation, Polarization, Interferometry, Electromagnetic radiation, Computer simulations, Near field, Distance measurement, Near field diffraction, Objectives, Singular optics, Electromagnetism, Nanofabrication, Radio propagation, Diffraction gratings

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PROCEEDINGS ARTICLE | March 15, 2016

Phase analysis of amplitude binary mask structures

Proc. SPIE. 9780, Optical Microlithography XXIX

KEYWORDS: Diffraction, Phase shifting, Visualization, Microscopy, Image resolution, Phase shift keying, Printing, Optical proximity correction, Phase measurement, Binary data

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PROCEEDINGS ARTICLE | March 4, 2016

Structured amplitude and phase fields behind microstructures: the quest for high contrast modulation at proximity

Proc. SPIE. 9764, Complex Light and Optical Forces X

KEYWORDS: Lithography, Diffraction, Modulation, Phase shift keying, Printing, Photomasks, Phase measurement, Geometrical optics, Neodymium, Stray light

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SPIE Journal Paper | January 29, 2016

Intensity and phase fields behind phase-shifting masks studied with high-resolution interference microscopy

Puthankovilakam, Krishnaparvathy , Scharf, Toralf , Kim, Myun-Sik , Naqavi, Ali , Herzig, Hans Peter , Weichelt, Tina , Zeitner, Uwe , Vogler, Uwe , Voelkel, Reinhard

JM3 Vol. 15 Issue 02

KEYWORDS: Phase shifts, Photomasks, Printing, Phase measurement, Microscopy, Diffraction, Quartz, Semiconducting wafers, Resolution enhancement technologies, Mach-Zehnder interferometer

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PROCEEDINGS ARTICLE | March 18, 2015

Intensity and phase fields behind Phase Shifting Masks studied with High Resolution Interference Microscopy

Proc. SPIE. 9426, Optical Microlithography XXVIII

KEYWORDS: Diffraction, Phase shifting, Quartz, Microscopy, Printing, Photomasks, Optical proximity correction, Phase measurement, Tolerancing, Phase shifts

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PROCEEDINGS ARTICLE | August 18, 2014

Shaping intensity behind amplitude masks for proximity correction lithography: design, measurement, and realization

Proc. SPIE. 9203, Interferometry XVII: Techniques and Analysis

KEYWORDS: Lithography, Microscopes, Beam splitters, Lithographic illumination, Printing, Objectives, Photomasks, Optical proximity correction, Structural design, Resolution enhancement technologies

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Showing 5 of 6 publications

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