Dr. Kristopher A. Lavery
Hardware Engineer at Verily Life Sciences
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: FT-IR spectroscopy, Switches, Polymers, Glasses, Diffusion, Image resolution, Photoresist materials, Solids, Extreme ultraviolet, Temperature metrology

Proceedings Article | 3 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Switches, Magnesium, Image processing, Atomic force microscopy, Photoresist materials, Image quality, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist developing

Proceedings Article | 12 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Optical lithography, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Performance modeling, Systems modeling, Photoresist developing, Standards development

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Polymers, Interfaces, Diffusion, Reflectivity, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Process modeling

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