In this work we present the grid of microstructures which is used for the graphene mechanical and electrical properties
investigations. The design of the mask used for the grid production was presented. Afterwards the technological process
steps for the grid production were described. In result the support structures – trenches – in shape of lines, squares and
circles are obtained with the detail dimensions varied from 1 micrometer up to 30 micrometers. Examples of graphite
and graphene deposited on the support structures are also presented.
The work presents the results of a research carried out with Plasmalab Plus 100 system, manufactured by Oxford
Instruments Company. The system was configured for deposition of diamond-like carbon films by ICP PECVD method.
The deposition processes were carried out in CH<sub>4</sub> or CH<sub>4</sub>/H<sub>2</sub> atmosphere and the state of the plasma was investigated by
the OES method. The RF plasma was capacitively coupled by 13.56 MHz generator with supporting ICP generator
(13.56 Mhz). The deposition processes were conducted in constant value of RF generator’s power and resultant value of
the DC Bias. The power values of RF generator was set at 70 W and the power values of ICP generator was set at 300
W. In this work we focus on the influence of DLC film’s thickness on optical, electrical and structural properties of the
deposited DLC films. The quality of deposited DLC layers was examined by the Raman spectroscopy, AFM microscopy
and spectroscopic ellipsometry. In the investigated DLC films the calculated sp<sup>3</sup> content was ranging from 60 % to 70 %.
The films were characterized by the refractive index ranging from 2.03 to 2.1 and extinction coefficient ranging from
0.09 to 0.12.