Dr. Kuang-Jung Chen
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (32)

PROCEEDINGS ARTICLE | April 16, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Lithographic illumination, Polymers, Silicon, Chemistry, Photomasks, Reactive ion etching, Photoresist processing, Semiconducting wafers, Photoresist developing

PROCEEDINGS ARTICLE | March 19, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Polymers, Silicon, Reflectivity, Chromophores, Silicon films, Solids, Critical dimension metrology, Semiconducting wafers, Bottom antireflective coatings

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Etching, Dielectrics, Scanning electron microscopy, Photomasks, Double patterning technology, Reactive ion etching, Photoresist processing

PROCEEDINGS ARTICLE | March 30, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Polishing, Optical lithography, Etching, Copper, Dielectrics, Photoresist materials, Reactive ion etching, Semiconducting wafers, Back end of line

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Semiconductors, Lithography, Particles, Silicon, Scanning electron microscopy, Photomasks, Double patterning technology, Reactive ion etching, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Optical lithography, Einsteinium, Etching, Dielectrics, Photoresist materials, Nanoimprint lithography, Reactive ion etching, Semiconducting wafers, Back end of line

Showing 5 of 32 publications
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