Kunal N. Taravade
Director of Product Engineer at Synopsys Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (12)

Proceedings Article | 24 February 2021 Presentation
Proc. SPIE. 11613, Optical Microlithography XXXIV

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Computer simulations, 3D modeling, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers, Tolerancing

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Image processing, Manufacturing, Electroluminescence, Photomasks, Cadmium sulfide, Source mask optimization, Optical proximity correction, Optimization (mathematics), Semiconducting wafers

Proceedings Article | 29 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Spatial light modulators, Image quality, Photomasks, Optical proximity correction, Convolution, Modulation transfer functions, Critical dimension metrology, Stray light, Semiconducting wafers, Stereolithography

Proceedings Article | 15 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Atrial fibrillation, Image segmentation, Computer simulations, Optical proximity correction, Semiconducting wafers, Tolerancing, Performance modeling, Model-based design, Resolution enhancement technologies

Showing 5 of 12 publications
Conference Committee Involvement (4)
DTCO and Computational Patterning
27 February 2022 | San Jose, California, United States
Optical Lithography XXXIV
22 February 2021 | Online Only, California, United States
Optical Microlithography XXXIII
25 February 2020 | San Jose, California, United States
Optical Microlithography XXXII
26 February 2019 | San Jose, California, United States
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